实验室材料
高纯氧化钒(V2O3)溅射靶材/粉/丝/块/粒
货号 : LM-V2O3
价格根据 规格和定制情况变动
- 化学式
- V2O3
- 纯度
- 4N
- 形状
- 无
运输:
联系我们 获取运输详情 享受 准时发货保证.
我们以合理的价格提供实验室用氧化钒(V2O3)材料。我们的专长是生产和定制不同纯度、形状和尺寸的氧化钒(V2O3)材料,以满足您的特定需求。
我们为各种类型的溅射靶材(圆形、方形、管状、不规则形)、涂层材料、圆柱、圆锥、颗粒、箔、粉末、3D 打印粉末、纳米粉末、线棒、锭和块等提供各种规格和尺寸的选择。
详细信息
关于氧化钒(V2O3)
氧化钒(V2O3)是一种氧化钒,适用于玻璃、光学和陶瓷领域的各种应用。虽然氧化物化合物一般不导电,但某些过氧化物结构的氧化物具有导电性,可用于固体氧化物燃料电池和制氧系统的阴极。
氧化物通常至少含有一个氧阴离子和一个金属阳离子。它们不溶于水溶液且高度稳定,因此可用于生产粘土碗、先进的电子产品、航空航天中的轻质结构组件以及电化学系统(如燃料电池)等一系列应用,在这些应用中,它们表现出离子导电性。
金属氧化物化合物是碱性酸酐,在氧化还原反应中可与酸和强还原剂发生反应。一般情况下,大多数氧化钒都可以获得,也可以考虑高纯度、亚微米和纳米粉体形式的氧化钒。
成分质量控制
- 原材料成分分析
- 通过使用ICP和 GDMS,对金属杂质含量进行检测分析,确保符合纯度标准;
非金属杂质通过碳硫分析仪、氮氧分析仪等设备检测。 - 金相探伤分析
- 使用探伤设备对靶材进行检验,确保产品内部无缺陷、缩孔;
通过金相检测,分析靶材内部晶粒组织,确保晶粒细小、致密。 - 外观尺寸检查
- 产品尺寸采用千分尺、精密卡尺测量,确保符合图纸;
使用表面清洁度计测量产品的表面光洁度和清洁度。
传统溅射靶材尺寸
- 准备过程
- 热等静压 压制、真空熔炼等
- 溅射靶材形状
- 平面溅射 靶材、多弧溅射靶材、阶梯溅射靶材、异型 溅射靶材
- 圆形溅射靶材尺寸
- 直径:25.4mm / 50毫米/50.8毫米/60毫米/76.2毫米/80毫米/100毫米/101.6毫米/152.4毫米
厚度: 3mm / 4mm / 5mm / 6mm / 6.35mm
尺寸可定制。 - 方形溅射靶材尺寸
- 50×50×3mm / 100×100×4mm / 300×300×5mm,尺寸可定制
可用的金属形式
金属形式细节
我们生产元素周期表中列出的几乎所有金属,范围广泛形式和纯度,以及标准尺寸和尺寸。 我们还可以生产定制产品以满足客户的特定要求,例如尺寸、形状、表面积、成分等。 以下列表提供了表格示例我们提供,但并不详尽。 如果您需要实验室耗材,请联系我们直接索取报价。
- 平面/平面形式:板、薄膜、箔、微箔、微叶、纸、板、带、片材、带材、胶带、晶圆
- 预成型形状:阳极、球、带、棒、船、螺栓、煤块、阴极、圆形、线圈、坩埚、晶体、立方体、杯子、圆柱体、圆盘、电极、纤维、细丝、法兰、网格、透镜、心轴、螺母、零件、棱镜、圆盘、环、棒、形状、护罩、套筒、弹簧、方形、溅射靶、棒、管子、垫圈、窗户、电线
- 微型尺寸:珠子、小块、胶囊、碎片、硬币、灰尘、薄片、谷物、颗粒、微粉、针、颗粒、卵石、颗粒、针、丸、粉末、刨花、弹丸、子弹、球体、药片
- 宏观尺寸:钢坯、大块、切屑、碎片、锭、块、金块、碎片、 冲孔、岩石、废料、段、车削
- 多孔和半多孔:织物、泡沫、纱布、蜂窝、网、海绵、羊毛
- 纳米级:纳米粒子、纳米粉末、纳米箔、纳米管、纳米棒、纳米棱柱
- 其他:浓缩物、墨水、糊状物、沉淀物、残留物、样品、标本
KinTek专注于高纯和超高纯材料的制造纯度范围为 99.999% (5N)、99.9999% (6N)、99.99995% (6N5),在某些情况下,高达 99.99999% (7N)。 我们的材料有特定等级可供选择,包括 UP/UHP、半导体、电子、沉积、光纤和 MBE 牌号。 我们的高纯度金属、氧化物和化合物经过专门设计,以满足严格的要求 高科技应用,非常适合用作掺杂剂和前体材料 用于薄膜沉积、半导体晶体生长以及合成 纳米材料。 这些材料可用于先进的微电子、太阳能电池、燃料 电池、光学材料和其他尖端应用。
包装
我们的高纯度材料采用真空包装,每种材料都有特定的包装 根据其独特的特点量身定制。 例如,我们的 Hf 溅射靶材带有外部标记 并贴上标签,以便于有效识别和质量控制。 我们非常小心 防止在储存或运输过程中可能发生的任何损坏。
4.9
out of
5
KinTek's Vanadium Oxide (V2O3) Sputtering Target is a lifesaver. It's so pure and consistent that it's made our thin film deposition process so much easier.
4.8
out of
5
I've been using KinTek's V2O3 sputtering targets for years, and they've never let me down. The quality is always top-notch, and the prices are unbeatable.
4.7
out of
5
KinTek's Vanadium Oxide (V2O3) Sputtering Target is the best I've ever used. It's so easy to work with, and the results are always amazing.
4.9
out of
5
I was really impressed with the quality of KinTek's V2O3 sputtering target. It's made a huge difference in the performance of our thin film deposition system.
4.8
out of
5
KinTek's V2O3 sputtering target is the perfect solution for our research needs. It's pure, consistent, and affordable.
4.7
out of
5
I've been using KinTek's V2O3 sputtering targets for a few months now, and I'm really happy with the results. They're very consistent and produce high-quality thin films.
4.9
out of
5
KinTek's V2O3 sputtering target is the best I've ever used. It's so pure and consistent that it's made a huge difference in the quality of our thin films.
4.8
out of
5
I was really impressed with the quality of KinTek's V2O3 sputtering target. It's made a huge difference in the performance of our thin film deposition system.
4.7
out of
5
KinTek's V2O3 sputtering target is the perfect solution for our research needs. It's pure, consistent, and affordable.
4.9
out of
5
I've been using KinTek's V2O3 sputtering targets for a few months now, and I'm really happy with the results. They're very consistent and produce high-quality thin films.
4.8
out of
5
KinTek's V2O3 sputtering target is the best I've ever used. It's so pure and consistent that it's made a huge difference in the quality of our thin films.
4.7
out of
5
I was really impressed with the quality of KinTek's V2O3 sputtering target. It's made a huge difference in the performance of our thin film deposition system.
4.9
out of
5
KinTek's V2O3 sputtering target is the perfect solution for our research needs. It's pure, consistent, and affordable.
4.8
out of
5
I've been using KinTek's V2O3 sputtering targets for a few months now, and I'm really happy with the results. They're very consistent and produce high-quality thin films.
4.7
out of
5
KinTek's V2O3 sputtering target is the best I've ever used. It's so pure and consistent that it's made a huge difference in the quality of our thin films.
4.9
out of
5
I was really impressed with the quality of KinTek's V2O3 sputtering target. It's made a huge difference in the performance of our thin film deposition system.
4.8
out of
5
KinTek's V2O3 sputtering target is the perfect solution for our research needs. It's pure, consistent, and affordable.
4.7
out of
5
I've been using KinTek's V2O3 sputtering targets for a few months now, and I'm really happy with the results. They're very consistent and produce high-quality thin films.
4.9
out of
5
KinTek's V2O3 sputtering target is the best I've ever used. It's so pure and consistent that it's made a huge difference in the quality of our thin films.
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